- Clean rooms facilities (750 m²) including a complete set of equipment dedicated to micro and nanofabrication.
- Thin film coating (PEALD, PVD, CVD, PECVD…)
- Optical Lithography (up to 200 mm diameter wafers)
- Thermal furnaces and Rapid Thermal annealing (RTA)
- Reactive Ion Etching (SF6, CHF3, BCl2…)
- Wafer dicing and wire bonding
- Ion implantation
- Chemical benches for wafer cleaning and etching
The CIME Nanotech is a joint research and education facilities dedicated to microelectronics and nanotechnology. The mission of the centre is to offer state-of-the-art facilities to support research and education in the fields of integrated devices for nanoelectronics and systems, biochips, integrated circuits design, nanocaracterisation, smart devices, sensors and actuators, MEMS and NEMS, hyperfrequency and guided optics. The centre is part of a national network which provides services in micro and nanotechnology research and to the education community. The CIME Nanotech hosts every year around 1,800 people coming from 12 universities nationwide and from 30 laboratories (LMGP, TIMA, IMEP-LAHC, Spintec, CEA, CNRS…). Several private companies and start-ups benefit from our service each year. The centre is jointly operated by the Grenoble Institute of Technology and the University Grenoble Alpes.